Dear BSIM Users, Thank you for your support of the BSIM models. We are releasing the BSIM4.3.0 models today, May 09, 2003. BSIM4.3.0 is developed to address several new issues in modeling sub-0.13 micron CMOS technology and RF high-speed CMOS circuit simulation. The plans and progress of the development were presented and discussed at several Compact Model Council (CMC) meetings in 2002 ~ 2003 period. Many inputs and several requests from those meetings were incorporated into the model. BSIM4.3.0 version was tested by several companies and their feedback was incorporated into this version as well. BSIM4.3.0 has the following major improvements and additions over BSIM4.2.1: 1. A new scalable stress effect model for process induced stress effect; device performance becoming thus a function of the active area geometry and the location of the device in the active area; 2. A unified current-saturation model that includes all mechanisms of current saturation - velocity saturation, velocity overshoot and source end velocity limit; 3. A new temperature model format that allows convenient prediction of temperature effects on saturation velocity, mobility, and S/D resistances; 4. Enhanced accuracy and flexibility of holistic thermal noise model; 5. Improved accuracy of forward body bias model; and 6. Extension of gate direct tunneling model to multiple-layer gate dielectrics. In addition, there are nine bug fixes in this version. The complete list of bugs and fixes and the users who reported them, the BSIM4.3.0 source code, BSIM4.3.0 user manual, BSIM4.3.0 new enhancement document and testing examples can be downloaded at: http://www-device.eecs.berkeley.edu/~bsim3/bsim4.html BSIM4.3.0 beta received intensive evaluation by TSMC, Silvaco, STmicroelectronics, TI Tiburon-DA and Motorola. Their testing materially and substantially improved the quality of the present production release. We would like to express our sincere thanks to the input from all the users. Special thank goes to Dr. Keith Green, Chairman of the Technical Issues Subcommittee of CMC; Britt Brooks, chair of CMC, Dr. Joe Watts, Secretary of CMC, and Dr. Ke-Wei Su for their guidance and technical support. We would like to acknowledge the data and support provided by the following companies: TSMC, NEC, IBM, Mindspeed, TI, Hitachi, and AMD. We thank you for your support to BSIM and welcome your feedback on this latest model. Sincerely, BSIM Team UC Berkeley